Museum Residency: International Print

The International Print Residency - Mon Lun Choo

We are delighted to announce that Mon Lun Choo (Mona) from Singapore, has been selected for the International Print Residency, run in partnership with londonprintstudio and the V&A.

The award is aimed at mid-career, non-UK based artists or designers, and Mona will start her six month residency and professional development programme at the new Sackler Centre for arts education at the V&A in January 2009.

Mona submitted a beautifully crafted proposal in which she spoke about her interests in the metaphysical energy of the collection at the V&A, where objects take on the guise of language - some are easily understood while others remain incoherent. Mona is very interested in the re-use of textiles, and is a particular admirer of Becky Earley’s work.

Mona will receive a grant towards production of new work; studio space at the V&A; access to specialist print facilities and technical support at londonprintstudio and London Printworks Trust; access to the world-class collections at the V&A, and assistance with flights and accommodation.

We look forward to working with Mona from January next year.

The International Print Residency is kindly supported by the Paul Hamlyn Foundation.